Product

MESOSCOPE designs and fabricates Metallic Nano-scale probe tip. Via Core-technology, Micro-Surface-Treatment process, all products are cleaned and contact resistance could be down to 50ohm.

MSCT-SA025TPL013TC025-CR2

MSCT-SA025TPL013TC025-CR2

CR2 is ideal for failure analysis ≦2nm process.

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MSCT-SA025TPL013TC025-CR1

MSCT-SA025TPL013TC025-CR1

CR1 is ideal for failure analysis ≦2nm process.

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MSCT-SA025TPL013TC025-CR5

MSCT-SA025TPL013TC025-CR5

CR5 is ideal for failure analysis 5nm-10nm process.

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MSCT-SA025TPL013TC025-CR3

MSCT-SA025TPL013TC025-CR3

CR3 is ideal for failure analysis ≦5nm process.

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MSCT-SA025TPL013TC025-CR14

MSCT-SA025TPL013TC025-CR14

CR7 is ideal for failure analysis 10nm-20nm process.

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MSCT-SA025TPL013TC025-CR7

MSCT-SA025TPL013TC025-CR7

CR7 is ideal for failure analysis 7nm-10nm technology process.

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MSCT-SA025TPL013TC025A2-CR50

MSCT-SA025TPL013TC025A2-CR50

CR50 is ideal for failure analysis ≧55nm process.

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MSCT-SA025TPL013TC025-CR250

MSCT-SA025TPL013TC025-CR250

Available to be measured below 250nm device

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MSCT-SA025TPL013TC025-CR200

MSCT-SA025TPL013TC025-CR200

CR200 is ideal for failure analysis ≧180nm process.

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MSCT-SA025TPL013TC025-CR150

MSCT-SA025TPL013TC025-CR150

Available to be measured below 150nm device

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MSCT-SA025TPL013TC025-CR100

MSCT-SA025TPL013TC025-CR100

Available to be measured below 130nm device

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MSCT-SA025TPL013TC025A2-CR10

MSCT-SA025TPL013TC025A2-CR10

CR10 is ideal for failure analysis 10nm to 20nm technology process.
Standard type has better durability.

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