CR5 is ideal for failure analysis 5nm-10nm process.
- Available on FEI, JEOL, Tescan, Zeiss and Kleindiek systems.
- No need Chemical Clean Process.
- SEM inspection before packing.
- Tip's Resistance is under 50ohm.
- MESOSCOPE unique MST(Micro Surface Treatment) process to increase tip uniformity.
- Wire diameter option: 0.1mm, 0.25mm, 0.3mm, 0.5mm and 0.6mm.
- Available to be measured 5nm-10nm process.
|Wire Diameter(WD)||0.25mm||Total Probe Length(TPL)||12.5mm|
|Tape Cone(TC)||2.5mm||Tip Body Diameter(TBD)||-|
|Tape Cone Angle Type||-||Curvature Radius(CR)||<5nm|
|Probe Pre-bent||-||Pre-sleeved into Capillary||-|
|Suitable for measuring Process||5nm-10nm Process|
- Application: SA series for SEM based electrical nano-probing application.
- Wire diameter (WD): 0.25mm
- Total probe length (TPL): 12.5mm
- Tape Cone length (TC): 2.5mm
- Curvature radius (CR): <5nm
Diameter at position of 50nm below apex is in the range of 35nm to 45nm.